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A common technique for forming polysilicon interconnects is by chemical vapor deposition (CVD) of polysilicon or amorphous silicon. However, at the initial stages of semiconductor processing, typically after the formation of a gate electrode, the surface of the gate electrode consists of polysilicon that is covered by a thin oxide film. The polysilicon consists of a plurality of amorphous grains with irregular surfaces that is formed by chemical deposition. The step of polysilicon deposition, which usually starts with the deposition of the gate electrode, results in a rough surface, which must be planarized before further processing can occur.
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